Metrology, inspection, and process control for microlithography XXIII (23-26 February 2009, San Jose, California, United States)Allgair, John Alexander; Raymond, Christopher J.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 2 vol, 2, isbn 978-0-8194-7525-1 0-8194-7525-4Conference Proceedings

MOSAIC: a new wavefront metrologyANDERSON, Christopher N; NAULLEAU, Patrick P.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72720B.1-72720B.7, 2Conference Paper

Proximity Matching for ArF and KrF ScannersYOUNG KI KIM; POHLING, Lua; NG TENG HWEE et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72723A.1-72723A.11, 2Conference Paper

Overlay Metrology for Double Patterning ProcessesLERAY, Philippe; CHENG, Shaunee; LAIDLER, David et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72720G.1-72720G.9, 2Conference Paper

Scanner matching optimizationSUPERS, Michiel; KLINGBEIL, Patrick; TSCHISCHGALE, Joerg et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72723B.1-72723B.7, 2Conference Paper

An Investigation of Perfluoroalkylamine Contamination ControlDALLAS, Andrew J; ZASTERA, Dustin.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727220.1-727220.9, 2Conference Paper

Developing an Uncertainty Analysis for Optical ScatterometryGERMER, Thomas A; PATRICK, Heather J; SILVER, Richard M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72720T.1-72720T.11, 2Conference Paper

Sampling for advanced overlay process controlKATO, Cindy; HIROYUKI, Kurita; IZIKSON, Pavel et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727206.1-727206.7, 2Conference Paper

Cr migration on 193nm binary photomasksBRULEY, John; BURR, Geoffrey; WATTS, Andrew et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727215.1-727215.6, 2Conference Paper

Use of 3D Metrology for Process ControlRIJPERS, Bart; FINDERS, Jo; SUZUKI, Hidekazu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727235.1-727235.11, 2Conference Paper

In-Die Registration Metrology on Future Generation ReticlesROETH, Klaus-Dieter; LASKE, Frank; KINOSHITA, Hiroshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72722W.1-72722W.7, 2Conference Paper

Alignment method of Self-Aligned Double Patterning processTSAI, Meng-Feng; LAI, Jun-Cheng; CHANG, Yi-Shiang et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72721Q.1-72721Q.9, 2Conference Paper

Applications of AFM in semiconductor R&D and manufacturing at 45 nm technology node and beyondLEE, Moon-Keun; SHIN, Minjung; TIANMING BAO et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72722R.1-72722R.12, 2Conference Paper

CD-SEM Parameter Influence on Image Resolution and Measurement AccuracyBUNDAY, Benjamin; KRAMER, Uwe.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727204.1-727204.12, 2Conference Paper

Compute Resource Management and TAT Control in Mask Data PrepNOUH, Ahmed; JANTZEN, Kenneth; PARK, Minyoung et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727216.1-727216.8, 2Conference Paper

Dark-field optical scatterometry for line width roughness metrologyZHUANG, G. Vera; SPIELMAN, Steven; FIELDEN, John et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72720L.1-72720L.12, 2Conference Paper

EFFICIENT USE OF DESIGN BASED BINNING METHODOLGY IN A DRAM FABKARSENT, Laurent; WEHNER, Amo; FISCHER, Andreas et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727239.1-727239.9, 2Conference Paper

Haze Generation Model and Prevention Techniques for Sulfate Free Cleaned MaskPATIL, Manish; KIM, Jong-Min; HUR, Ik-Boum et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72721X.1-72721X.9, 2Conference Paper

Hole inspection technology using Fourier imaging methodYOSHINO, Kiminori; TSUCHIYA, Kenji; YAMAZAKI, Yuichiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727233H.1-72723H.8, 2Conference Paper

Implementation of Multiple ROI with single FOV for advanced mask metrologyJEONG, Kyu-Hwa; FREZGHI, Hatsey; TAVASSOLI, Malahat et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72724D.1-72724D.9, 2Conference Paper

Implementation of The High Order Overlay Control for Mass Production of 40nm Node Logic DevicesUMEDA, Daisuke; MIYASAKA, Mami; UCHIYAMA, Takayuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72720H.1-72720H.8, 2Conference Paper

Improved Mask-Based CD Uniformity for Gridded-Design-Rule LithographyFAIVISHEVSKY, Lev; KHRISTO, Sergey; SAGIV, Amir et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727229.1-727229.13, 2Conference Paper

Increased Uniformity Control in a 45nm Polysilicon Gate Etch ProcessPARKINSON, Blake; PRAGER, Dan; FUNK, Merritt et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72721J.1-72721J.11, 2Conference Paper

Inspection and metrology tools benefit from free form refractive micro-lens and micro-lens arraysBIZJAK, Tanja; MITRA, Thomas; ASCHKE, Lutz et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72723Q.1-72723Q.8, 2Conference Paper

Investigation of factors causing difference between simulation and real SEM imageKADOWAKI, M; HAMAGUCHI, A; ABE, H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72723I.1-72723I.9, 2Conference Paper